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For Claudia, creation is about stimulating ideas and giving them form. Inspired by architecture, science, design, technology, music, film, photography, poetry, and above all, nature, she draws from diverse art forms to escape conformity while staying true to an organic flow. Refusing categories and trends, she seeks only authenticity and freedom in her work.
A Swiss artist, Claudia explores two converging fields: Contemporary Fine Art and Industrial Art inspired by New Realism. Trained as a graphic designer at the Hochschule für Gestaltung und Kunst in Lucerne, she later worked in Stuttgart alongside Anton Stankowski, master of German design. In New York, she specialized in silk-screen printing at the Fashion Institute of Technology, receiving prizes while studying fabric design and modern technologies.
Today, she devotes herself fully to contemporary art, blending technology, mixed media, and nature as her core inspirations. Her original works are showcased in galleries, institutions, corporate and private collections, art fairs, and commissioned projects worldwide.